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01113naa a2200301 i 4500 |
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NSK01001073535 |
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HR-ZaNSK |
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20200910091712.0 |
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ta |
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200910s2017 ci | |0|| ||eng |
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|a (HR-ZaNSK)001073535
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|a HR-ZaNSK
|b hrv
|c HR-ZaNSK
|e ppiak
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|a croatica
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|a ci
|c hr
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1 |
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|a 669
|2 2011
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| 080 |
1 |
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|a 620
|2 2011
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| 100 |
1 |
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|a Walke, Witold
|4 aut
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| 245 |
1 |
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|a Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer /
|c W. [Witold] Walke, M. Kaczmarek, M. [Marcin] Staszuk, M. Basiaga.
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| 300 |
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|b Ilustr.
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| 504 |
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|a Bibliografija: 10 jed.
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| 653 |
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0 |
|a Titan
|a Legure titana
|a Elektrokemijska svojstva
|a Mehanička svojstva
|a Kemijski reaktor
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| 700 |
1 |
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|a Kaczmarek, M.
|4 aut
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| 700 |
1 |
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|a Staszuk, Marcin
|4 aut
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| 700 |
1 |
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|a Basiaga, M.
|4 aut
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| 773 |
0 |
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|t Metalurgija (Sisak)
|x 0543-5846
|g 56 (2017), 1/2 ; str. 179-181
|w nsk.(HR-ZaNSK)000013552
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| 981 |
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|b B17/17
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| 998 |
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|b rpeo2009
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| 856 |
4 |
1 |
|u https://hrcak.srce.hr/168925
|y Elektronička verzija članka
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