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01025cam a2200289 i 4500 |
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20130713153807.0 |
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800514s1980 nyua b 001 0 eng |
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|a 80017047
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|a 047107828X :
|c $26.95 (est.)
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| 040 |
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|a DLC
|c DLC
|d HR-ZaFER
|b hrv
|e ppiak
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| 050 |
0 |
0 |
|a QC702.7.P6
|b C48
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| 082 |
0 |
0 |
|a 537.5/2
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| 100 |
1 |
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|a Chapman, Brian N.
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| 245 |
1 |
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|a Glow discharge processes :
|b sputtering and plasma etching /
|c Brian Chapman.
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| 260 |
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|a New York :
|b Wiley,
|c 1980.
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| 300 |
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|a xv, 406 str. :
|b ilustr. ;
|c 24 cm.
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| 500 |
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|a "A Wiley-Interscience publication."
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| 500 |
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|a Includes index.
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| 504 |
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|a Bibliography: p. 397-400.
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| 650 |
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0 |
|a Sputtering (Physics)
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| 650 |
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0 |
|a Glow discharges.
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| 650 |
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0 |
|a Plasma etching.
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| 856 |
4 |
2 |
|3 Publisher description
|u http://www.loc.gov/catdir/description/wiley034/80017047.html
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| 856 |
4 |
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|3 Table of Contents
|u http://www.loc.gov/catdir/toc/onix05/80017047.html
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| 906 |
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|a 7
|b cbc
|c orignew
|d 1
|e ocip
|f 19
|g y-gencatlg
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| 942 |
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|2 udc
|c K
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| 999 |
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|c 40729
|d 40729
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