Dutton, R. W. (1977). NATO advanced study institute on process and device modeling for integrated circuit design: NATO advanced study institute on process and device modeling for integrated circuit design : silicon epitaxy and oxidation; bipolar models for statistical IC design; simulation of integrated circuits fabrication processes (1. izd.). NATO.
Chicago stil citiranjaDutton, Robert W. NATO advanced study institute on process and device modeling for integrated circuit design: NATO advanced study institute on process and device modeling for integrated circuit design : silicon epitaxy and oxidation; bipolar models for statistical IC design; simulation of integrated circuits fabrication processes. 1. izd. NATO, 1977.
MLA stil citiranjaDutton, Robert W. NATO advanced study institute on process and device modeling for integrated circuit design: NATO advanced study institute on process and device modeling for integrated circuit design : silicon epitaxy and oxidation; bipolar models for statistical IC design; simulation of integrated circuits fabrication processes. 1. izd. NATO, 1977.